Center for Nanotechnologies (CNT)
under the aegis of Romanian Academy

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L6: Microphysical characterization laboratory

Laboratory Head: Phys. Adrian Dinescu (adrian.dinescu@imt.ro)

Mission: Research and development in the field of characterization methods for materials and processes at micro and nanometric scale. Application of high resolution surface investigation techniques to solve engineering problems at these scales, especially investigation of correlations between technological process parameters-structure and structure-properties order to obtain materials for specific applications etc. The lab is the first one in Romania developing research and providing services for nanolithography, using EBL technique.

Main areas of expertise: Atomic Force Microscopy (AFM), Scanning Electron Microscopy (SEM), Electron Beam Lithography for nanoscale devices, Optical Microscopy, Electrical characterization of materials and devices.

Research team 3 senior researchers - background in Physics and Electronic Engineering an early stage researcher (Physics) and 2 MS students in Electronics.

International participation

FP7 CATHERINE "Carbon nAnotube Technology for High-speed nExt-geneRation nano-InterconNEcts"- STREP- FET proactive (2008-2010), Coordinator Consorzio Sapienza Innovazione, Italy.
Partners: CNIS-Italy, TUD-Netherlands, CIRIMAT-France, USL-Italy, ULV- Lativia, IMT- Bucharest- Romania, FOI- Sweden, INFN-Italy, PHILIPS- Netherlands, Smoltech- Sweden. IMT-Bucharest: Contact person Phys. Adrian Dinescu- (adrian.dinescu@imt.ro)

CATHERINE project aims to provide a new unconventional concept for local and chip-level interconnects that will bridge ICT beyond the limits of CMOS technology. The main goals of CATHERINE are: - To develop an innovative cost-effective and reliable technological solution for high-performance next-generation nanointerconnects. - To develop proof-of-concept nanointerconnects to assess and verify the new proposed solution.

High resolution CNTs imaging	Electric contacts at nanoscale- 65 nm width lines

EXPERIMENTAL LABORATORIES

Laboratory for nanoscale structuring and characterization (L6), created the following experimental labs:

Experimental laboratory for Electron Beam Lithography (EBL)/ Scanning electron Microscopy Laboratory (SEM), or NanoScaleLab; - Scanning Electron Microscope SEM - Vega II LMU and Pattern Generator - PG Elphy Plus (TESCAN s.r.o and RAITH GmbH); - A Nanolithography Equipment composed of a SEM and EBL pattern generater which can investigate different samples at nanometric range (SEM resolution 3 nm, smallest geometry line in the range of 30-50 nm) is used for different samples investigations, for direct writing in PMMA of nanometric configurations and for students training in microscopy and nanolitography.

Experimental laboratory for e-line nano engineering work station;

- Electron beam lithography and nanoengineering workstation - e_Line (RAITH GmbH ); EBL
Direct writing Electron Beam nanoLithography is an ideal tool for nanotechnology research and is a versatile equipment with specific requirements for interdisciplinary research: options for nanomanipulations; EBID-Electron Beam Induced Deposition; EBIE-Electron Beam Induced Deposition;

Applications:
• Nanolithography with under 20 nm resolution;
• 3D nanostructures;
• CNT based interconnections for next-generation integrated circuits;
• CNT based nanodevices;
• SAW devices with nanometer interdigitated electrodes;
• Optical devices, holograms, micro lenses, gratings;
• Development of Nanodevices using E-beam induced deposition and etching;
• Development of circuits for communications based on photonic crystals;

Experimental laboratory for SEM/FEG (Field Emission Gun);

- Field Emission Gun Scanning Electron Microscope/FEG-SEM-Nova NanoSEM 630 (FEI); The FEI Nova NanoSEM 630 is a high-quality nanoscale research tools for a variety of applications that involve sample characterization, analysis, prototyping, and S/TEM sample preparation. It features a superior low voltage resolution and high surface sensitivity imaging in the range of Ultra high Resolution Field Emission Scanning Electron Microscopes (UhR FE-SEM).

Experimental laboratory for SPM;

- Scanning Probe Microscope (AFM, STM, EFM, KPM etc)-NTEGRA (NT-MDT);

Applications:
• Surface morphology inspection;
• Quantitative measurement of surface features at nanometric level;
• Nano-surface texture/ roughness measurement;
• High-resolution surface profilometry;
• Evaluation and optimization of thin film coatings for various applications (optical, packaging, paintings, wear-resistant etc);
• Grain and particle size analysis;
• Morphological studies of biological and biocompatible materials;

- Nano Indenter G200, Agilent Instruments (former MTS Nano-Instruments): Instrument for characterizing the mechanical properties of materials at the nano and micro scales, mainly by performing depth-sensing indentation experiments, but also by other modes of testing such as scratch testing etc. Accuracy and repeatability of the measurements are guaranteed by implemented methods according to ISO 14577.

Technical specifications:
• Displacement resolution: 0.01 nm;
• Load resolution: 50 nN;
• Maximum load: 500 mN;
• Max indentation depth: 500 mm;
• Position accuracy: 1 mm;

Applications: Studies of mechanical properties of materials on small scales or near surfaces with high spatial resolution. The measurable properties include hardness, elastic modulus, nano-scratch critical loads, stress-strain data. The provided information is useful for developing and/or optimizing application specific materials and processes and also could be used as input data for running simulations of the material behavior by finite-element analysis.

FEG-SEM - Nova NanoSEM 630	Nanoengineering workstation e_Line (RAITH)
Scanning Probe Microscope SPM-NTEGRA	Nano Indenter G200

Dip pen nanolithography Laboratory; - Dip Pen Nanolithography Writer - NSCRIPTOR (NanoInk, Inc.);

System allows pattering in nanometric range and is direct writing method that can use molecular and biomolecular “inks” on a variety of substrates. It can selectively place molecules at specific places. Applications: surface functionalization (with direct liaison to proteomics, DNA recognition, virus identification); deposition materials onto semiconductor substrates for electronic industry; photolithographic masks correction; molecular electronics; realization of master stamps for NIL; novel nano- devices;

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Last update: December, 2009