Programme for Research-Development-Innovation on Space Technology and Advanced Research – STAR
(Romanian Space Agency)

Participating teams:

Laboratory of Micro/Nano Photonics, member of the European Centre of Excellence in Microwave, Millimetre Wave and Optical Devices, (funded by FP7 programme “Capacities”).

The lab relevant expertize includes: modelling and simulation of micro and nano photonic structures; new materials for micro-nanophotonics; soft lithography for photonics; development of photodetectors on different semiconductors, optical and electrical characterization of materials and devices.

The centre was involved in 4 FP6 projects (1 STREP- area nanophotonics, and 3 Networks of excellence in the areas microoptics and MEMS.

In FP7 the centre coordinated one large project (Program Capacities) and is participating in several research projects in the area of microoptics, optical MEMS and nanoelectronics.

   
Specific facilities:
  • Modelling and simulation:
 

- Opti FDTD 10.0 - design and simulation of advanced passive and nonlinear photonic devices
- OptiBPM 11.0- design of complex photonic integrated circuits for guiding, coupling, switching, splitting, multiplexing and demultiplexing of optical signals.
- OptiGrating- design software for modelling integrated and fiber optical devices that incorporate optical gratings
- LaserMod - analysis of optoelectronic devices
- 3Lit – design of 3D micro-optical elements
- Zemax – optical design

  • Characterization:
 

- spectrophotometers for UV-VIS-NIR and IR spectral range;
-
spectroscopic ellipsometer
-
High  Resolution Raman Spectrometers LabRAM HR
-
Alpha300 S SystemScanning Near-field Optical Microscope, Confocal Microscopy and Atomic Force Microscopy
- experimental set-up for optoelectric characterization in UV-VIS-IR spectral range (200-1100 nm), composed of CornerstoneTM 260. Monochromator connected by a mounting kit with a NEWPORT 300 W Xe Research Source, An Optical Power/Energy Meter (NEWPORT 1918-C), a calibrated UV Enhanced Silicon Photodetector (NEWPORT 918D-UV-OD3), Stanford Research SR830 Lock-In Amplifier and SR540 Optical Chopper, and a cryostat. 

  • Technology:
 

- glove box for preparation and deposition of nanocomposites and organic layers

   
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Laboratory for Micro- and Nanostructuring and Characterization with expertize in characterization and structuring methods for materials and processes at micro and nanometre scale (AFM, SEM, Nano indentation, electron beam lithography) with the mission to:

  • support the activity of IMT Bucharest with experimental characterization capabilities consisting of advanced equipment and skilled personnel in the field of characterization methods for materials, processes, structures and devices at micro and nano scale.
  • enhance the nanofabrication capabilities of IMT Bucharest by providing nanoscale patterning through electron beam lithography-based techniques
  • to develop application of high resolution surface investigation techniques to solve engineering problems at these scale parameters-structure and structure-properties order to obtain materials for specific applications

The laboratory is the first one in Romania developing research and providing services for nanolithography, using the Electron Beam Lithography technique.

The lab participated in many national projects and recently obtained excellent results in a project focused on nano-device based on carbon nanotubes (Carbon nAnotube Technology for High-speed nExt-geneRation nano-InterconNEcts – CATHERINE- (FP7/STREP, 2008-2010).

   
Main facilities:  
  • Electron Beam Lithography and nanoengineering workstation – Raith e_Line
  • Scanning Probe Microscope NTEGRA Aura (NT- MDT Co.) with various operating modes (AFM, STM, EFM, MFM, SKPM, Conductive AFM etc);
  • Nano Indenter G200 (Agilent Technologies, Inc.) for Nanomechanical characterization equipment, especially for small-volume samples (e.g. thin films);
  • Field Emission Gun Scanning Electron Microscope (FEG-SEM) –FEI Nova NanoSEM 630 (FEI)
  • Tungsten Heated Filament Scanning Electron Microscope-Tescan VEGA LMU II and Energy Dispersive
  • X Ray Spectrometer with Si(Li) detector – EDAX
   
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The Reliability Laboratory is aimed to provide tools and expertise to improve the design & technology of sensors, actuators, microsystems, nanostructures and microelectronic components by assessing and building the quality & reliability in a Concurrent Engineering approach.

The lab has expertise and modern equipment in:

  • Time dependence of micro and nanostructure characteristics, Behaviour of electronic materials & components in harsh environment
  • Design for reliability, Accelerated testing of nano materials, micro and nanostructures; Failure analysis & physics.

The lab was participated to many international projects, the most important that are relevant for the tasks allocated in this project being NoE ”Patent-DfMM” (FP6/IST project, 2004-2008). In the frame of this project, RL will participate to the activity of all workpackages and will be the leader of the activities linked to reliability testing and failure analysis.
Reliability testing:  

- Electrical characterising at various temperatures: Keithley 4200 SCS (C-V units  3532-50, DMM 2700-7700 and 2002; 6211-2182; Stimuli: Voltage CC < 100V, Current CC < 1A; Impulses: analogical signal 30V, <40MHz; Measurements: Voltage 0,5 μV, Current 1 fA), Temptronic TP04300A-8C3-11 (Thermo Stream - Temperature variation: -80oC... +250oC;Transition time: up 7 sec., down 20 sec., Temperature control 0.1oC);

- Environmental testing: Constant mechanical acceleration, Vibration, Storage at temperature, Hermeticity, Mechanical shock;
- Testing at unique or combined stresses: Damp heat, Thermal cycling, Pressure + Temperature, Thermal stress + Electrical stress, Electrical stress + Thermal stress + Humidity + Vibrations, Electrical stress + Thermal stress + Pressure, Mechanical (“Tilting”) + Thermal stress.

Failure analysis:  

Thermal analyses with IR microscope SC 5600 +  G3 L0605 / FLIR Systems.

The teams will also use the common facilities of IMT (lab for mask fabrication and the lab for technology processing, testing labs), grouped in “Centre for MIcro and NAnoFABrication- MINAFAB certified ISO 9001:2008 by TÜV THÜRINGEN.
A complete list of relevant facilities for this project is presented in Annex  4 Available research infrastructure