UPGRADING THE INFRASTRUCTURE FOR THE LABORATORY OF DIELECTRIC AND CONDUCTIVE THIN FILMS DEPOSITION FOR MICRO AND NANO-MANUFACTURING
(DDC-LAB)

Versiunea romana

About the project:

The project „Upgrading the infrastructure for the laboratory of dielectric and conductive thin films deposition for micro and nano-manufacturing” aims to upgrade the research infrastructure in the domain of dielectric and conductive thin films depositions in order to develop a facility of national interest, to increase the scientific excellence level, to develop offers o scientific and technological services at European level, develop new applications with impact in industry, medicine, environment and energy and increase the participation in European programs.

The project will accomplish:

a) Investments for upgrading the infrastructure of laboratory for dielectric and conductive thin films depositions for micro-nanomanufacturing;

b) Acquisition of equipments for research-development in the domain of dielectric thin films depositions using APCVD method at lower temperatures and conductive films deposition using the “direct writing” by Ink Jet;

c) Training activities for using and maintenance of equipments and training of users for using the new technological capabilities;

d) Developing new applications for industry, medicine, environment and energy;

e) Developing an offer for technological services for external users (companies, universities research centres) and connecting to the European network „Europractice” (where IMT is partner in the INTEGRAMplus project).