UPGRADING THE INFRASTRUCTURE FOR THE LABORATORY OF DIELECTRIC AND
CONDUCTIVE THIN FILMS DEPOSITION FOR MICRO AND NANO-MANUFACTURING
(DDC-LAB)
Results:
The laboratory infrastructure was upgraded, by public tender call. The works included:
1. Technical project for setting up a Clean Room 1.000 and 10.000;
2. Execution of the upgrade works;
New equipments have been contracted:
1. PECVD plasma deposition equipment, for CVD oxides, both doped and un-doped (PSG, BSG, BPSG), for MEMS or micro/nanoelectronic devices fabrication; (photo)
2. INK JET printing equipment, for conductive layers deposition, using the Ink Jet method, which allows direct deposition of metallic and polymeric materials;(photo)
3. Equipment for maintaining the technological needed conditions within the laboratory (cleanliness, humidity, temperature).
