Objectives:

• set-up the nanolithography equipment.
• set-up the nanolithography technological processes and find the minimal dimensions of the elements which can be configured by this processes.
• development of the etching processes through the nanolithographic mask.
• development of optical mask alignment for processes of micro and nanolithography,
• development of processes for multilevel nanostructures
• fabrication of diffractive optic elements and micro/nano diffraction gratings.
• development of the processes necessary for 1D and 2D photonic crystals;