MINAFAB Processing equipments

Atmospheric pressure chemical vapour deposition
PYROX, TEMPRESS

Description

APCVD installation (atmospheric pressure chemical vapour deposition) for deposition of  doped and non doped CVD oxides: PSG, BSG, BPSG in thick layers made to be  passive   in order to obtain  MEMS or microelectronic , obtaining dielectric layers for the devices with more metallization layers, or obtaining sacrifice layers in the surface for micro etching. 

 

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Applications:

  • For deposition of  doped and non doped CVD oxides: PSG, BSG, BPSG in thick layers made to be  passive   in order to obtain  MEMS or microelectronic , obtaining dielectric layers for the devices with more metallization layers, or  obtaining sacrifice layers in the surface for micro etching.

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Application scientist: eng. Liliana Staicu, liliana.staicu@imt.ro

 

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Last update: February 27, 2011