Wet process bench with laminar flow for resist development
Atechim 99 srl

Description

Wet processes for masks manufacturing (resist development, Cr etching, reist removing, DI cleanining).

 

******************************************************************

Applications:

  • Masks manufacturing

******************************************************************

Application scientist: eng. Ioana Stanca, [email protected]

 

HOME

top of page

Last update: February 19, 2009