Contact persons: Andrei Avram, PhD stud; Catalin Marculescu PhD
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Applications:
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Studies of various materials thickness on small scales.
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Accurate measurements of grown or deposited thin films.
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The provided information is useful for optimising silicon oxide growth or deposition of oxides and nitrides in LPCVD and PECVD equipments.
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Provides useful information regarding spin coated polymers and photoresists.
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Measurement of refractive index
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General characteristics:
- Transmission and reflection measurements of anti-reflective & hardness coatings
- Wide wavelength measurements (250nm to 1050 nm)
- Can measure up to 10 layer stacks
- Angle of incidence: 90o
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Performances:
- Resolution: 0.1 nm
- Thickness range: 10nm to 100μm
- Defect and roughness tolerant measurements
- Database for a broad range of materials
- Fast measurement process: 100ms to 1s
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Advantages:
- Easy to use
- Wide measurements range
- Can measure thicknesses for a wide range of materials
- Small footprint: light and portable
- Assisted by powerful computational software
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