MINAFAB Processing equipments

NEVA EDV-500A   Electronic Beam Gun, EVD-500A Basic System
E-beam high vacuum thin film deposition system



- Materials : Au, Al, Ag, Cr, Ni, Pt     
- 4 Crucibles Electronic Beam Gun
- Deposition Thickness Controller (Digital display with rate control) 
- Film thickness: 100nm to 1000nm
- maximum load per run: 30 wafers/3" or 18 wafers/4" or 12 wafers/5"





- electronics, electrooptics, photonics, biosensors


Application scientist: eng. Carmen Iorga,  carmen.iorga@imt.ro



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Last update: February 27, 2011