MINAFAB Processing equipments

Plasma-assisted chemical vapor deposition
LPX-CVD, STS ( UK)

Description

PECVD equipment for deposition of thin dielectric layers. (Plasma-assisted chemical vapor deposition of dielectric thin films).

 

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Applications:

  • Using this equipment it is possible to obtain silicon oxide , poly silicon , silicon nitride.

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Application scientist: eng. Liliana Staicu, liliana.staicu@imt.ro

 

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Last update: February 27, 2011