Laser system for microprocessing by local evaporation
PL 2143A, EKSPLA / EKSMA
Description
Operating wavelength: 266 nm, energy: 17 mJ / per pulse, pulse duration: 29 psec, energy can be varied in 100 steps up to the maximum one, X-Y translation stage: 15 cm travel, 0.1 micron resolution, 3 micron accuracy, minimum spot diameter: 20 microns, maximum spot diameter: 8 mm. System under assembly.
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Applications:
- Local evaporation of various types of materials for microprocessing applications
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| Application scientist: Dr. Phys. Gabriel Moagar-Poladian, gabi.moagar@imt.ro |
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Last update: May 18, 2009 |
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