Results:
     
SEM and optical image of the surface  etched in the (HNO3: HF: CH3COOH- 25:1:10) acid solution, general view
     

Scanning electron microscopy (SEM)  image of the Si surface covered with SnO2

Transmission spectra of the SnO2 (doped and undoped) films with in the range of 105-125 nm deposited on transparent glass substrate by sol-gel technique

Spectral reflectivity of the Si wafer with native oxide and coated with doped SnO2 after thermal treatment.

Spectral reflectivity of the Si wafer with native oxide and coated with undoped SnO2 after thermal treatmen