Results:
- participation at the realization of the "grey zone" class 100 000, technological area;
- acquisition of accessories for up-grading “e-line Ultra High Resolution Electron Beam Lithography and Nanoengineering Workstation, Raith GmbH ”. The modules allow the use at maximum performance of the EBL installation acquired from the German company RAITH, the unique European producer. These modules are:
-
fixed beam moving stage (FBMS)
- software compatible with RAITH50 technology;
- line max length 2 cm;
- sticking accuracy: < 30nm;
- electron beam modulation possibility during the exposure time;
- max exposure velocity: 3mm/sec;
- autonomous controller separately from EBL installation, work frequency: 10 MHz;
- Acquisition of nanoindenter, for nanomecanic characterization (Nanoindenter);
- Displacement resolution: 0.01 nm;
- Force resolution: 50 nN;
- Maximum force: 500 mN;
- Maximum indentation depth: 500 µm;
- Positioning accuracy: 1 µm;
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