ROMANIAN JOURNAL OF INFORMATION SCIENCE AND
TECHNOLOGY
Volume 3, Number 1, 2000, 49 - 56
Electrical Study of Insulator
Films
for Microwave Applications
Zsolt J. HORVATH, Maria
ADAM, Vo Van TUYEN, Csaba DUCSO, Bela SZENTPALI
Hungarian Academy of Sciences,
Research Institute for Technical Physics and Materials Science,
Budapest, P.O.Box 49, H-1525, Hungary,
E-mail: [email protected]
F. Giacomozzi
ITC-IRST, Via Sommarive 38050, Povo Trento, Italy,
E-mail: [email protected]
D. Pasquariello, K. Hjort
Uppsala Universitat, Dept. of Mat. Sci.
Microstructure Technology Group, P.O.B. 534,
Uppsala, Sweden, SE-751 21,
E-mail: [email protected]
P. Tutto
Semilab Rt., Budapest, Ăšjpest 3, P.O.Box 18, H-1347 Hungary,
E-mail: [email protected]
Abstract.
Electrical
behaviour of insulator films containing layers of SiOxNy with different composition and
thickness are studied by d.c. current-voltage and a.c. capacitance-voltage and
conductance-voltage measurements. The composition and preparation conditions have
remarkable effect on the electrical behaviour of the deposited layers. The obtained
results are compared and analysed. |