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Micro/nano/biotechnologies convergence [description of the field]
L2- Laboratory for Microsystems in biomedical and environmental applications
1. Mission
The Mission of the laboratory for microsystems in biomedical and environmental applications is research, focused on the development of microsensors (chemo resistive and resonant gas sensors), electrodes for biological sensors, microprobes for recording of electrical activity of cells and tissues, education in the field of micro chemo and biosensors (in cooperation with University "Politehnica" of Bucharest), and services in design, simulation and technology for bio- and chemo-applications.
2. Competence related to the field
Our lab’s main expertise is in the field of development of a large area of microsensors (chemoresistive, resonant gas sensors, accelerometers, microarrays, ISFET (Ion Sensitive Field Effect Transistors) sensors, electrodes for biological sensors, microprobes for recording of electrical activity of cells and tissues), in terms of software simulations / modelling, using MEMS–specific CAD software (CoventorWare, CADENCE), technological development and electrical characterisation.
We provide competences in the field of Micro/nano/biotechnologies’ convergence, by developing methodologies for integration of biomaterials into micro and nanosystems, including new processes for biomaterials deposition, packaging and measurement.
Our laboratory has an extensive work in the range of micro/nanosensors for environmental monitoring (mixed technologies for gas sensors microfabrication – including ceramic technologies, micropellistors for methane detection), agriculture and food quality management, biomedical applications and lab-on-chip systems (diamond-like carbon based biomedical MEMS, biosensors for bioterrorism toxins detection, biosensors for neurotoxic substances detection, microfluidic platforms for biomedical applications).
Laboratory for Microsystems in biomedical and environmental applications has also competences regarding Support actions, to ensure broad access to micro-nanosystems manufacturing technologies, in particular by SMEs, by organising national and regional workshops, forums and info-days, for disseminating the scientific information. Our previous SSA projects provide a wide database with national and international actors (Research Institutes, Universities, SMEs) in the micro-nanotechnologies field, which can be contacted for participating at such events.
3. Key people
 Dr. Carmen MOLDOVAN is the Head of the Microtechnology Department of the National Institute for Research and Development in Microtechnologies and Associate Professor at the Faculty of Electronics and Telecommunications, University “Politehnica” of Bucharest. She is graduated on Electronics and Telecommunications and PhD in Microsensors. She is Leader of the Virtual Network of Centres for Research in nanotechnologies for new materials and new nanoprocesses coordinated by IMT, Contact person for IMT in MST Design Consortium (EUROPRACTICE Provider, FP5 project) and REASON FP V project. Dr. Moldovan is the vicecoordinator of the FP 6 SSA “Micro and Nanotechnologies going to Eastern Europe through Networking (MINAEAST-NET)” and “ROManian Inventory and NETworking for Integration in ERA (ROMNET-ERA)”. She is involved in the NoE 4M (NMP), working on demonstrators, in Ceramic cluster, having the goal to integrate a non-standard micromachining processes to a ceramic substrate and in the Sensors and Actuators cluster. She is member of: IEEE and Science and Technology Commission of the Romanian Academy and NEXUSPLUS and BRIDGE subcontractor. The scientific activity is published in more than 46 papers in Journals, Books and communications in Proceedings.
Chem. Rodica Iosub graduated in 1980 in chemistry, within Bucharest University. She has a broad experience regarding silicon processing, especially silicon anisotropic and isotropic etching. She managed several national research projects, developing chemical sensors for biomedical and environmental applications.
Dr. Cristina Pachiu – Popa is a researcher within the Laboratory for Microsystems in biomedical and environmental applications. She graduated in physics in 2001, at Bucharest University and received her PhD title in 2006. She has wide competences in mechanical characterisations, periodical distribution and defects of composite structures, theoretical and numerical models of simulations for acoustics propagation’s phenomena in anisotropy backgrounds in solder structures.
Eng. Bogdan Firtat is a researcher within the National Institute for Research and Development in Microtechnologies, Centre of Microstructures and Microsystems for biomedical Applications and Environment Monitoring. He graduated on Electronics and Telecommunications, at “Politehnica” University of Bucharest in 2002 and since 2004 he is a PhD student on Microsystems. He has experience in microsystems design, simulations and technological fabrication, working in the field of mechanical and chemical microsensors. Bogdan has also experience in FP6 projects, both SSA and scientific projects. His current activities include simulation and design for microsystems and microfludics within INTEGRAMplus (FP6 IST-IP) and TOXICHIP (FP6 IST-STREP).
Eng. Claudia Roman received the MS degree in composite materials at University “Politehnica” of Bucharest and she is currently PhD student at the same university, Faculty of materials science. She is working in the Laboratory for Microsystems in biomedical and environmental applications at IMT-Bucharest and she is also carrying out management activities for international and national projects (e.g.: MINOS-EURONET, RO-NANOMED, PRO-BIOSYS).
4. Relevant projects
FP5/MST Systems - EUROPRACTICE
FP5/REASON - Training by Research by System on chip design
FP6/NMP: 4M NoE, Multi Material Micro Manufacture : Technolgy and Applications
FP6/IST: PATENT NoE, Desing for Micromanufacturig
FP6/SSA: ROMNET-ERA, Romanian Inventory and NEtworking for Integration in ERA
FP6/SSA: MINAEST-NET, MIcro and NAnotechnologies going to EASTern Europe through NETworking
FP6/SSA: MINOS-EURONET, MIcro and NAnotechnologies Network
FP6/CA: BRIDGE - EUROPRACTICE
FP6/SSA: NEXUSPLUS
FP6/IST: INTEGRAMplus IP - Integrated MNT platforms and services – Service Action
FP6/IST: Toxichip STREP - Development of a toxin screening multi-parameter on-line biochip system
5. Relevant equipments
“GeneMachines OmniGrid Micro” - Nano-Plotter, allowing bio-chips development;dispersing of adhesives and liquid crystals; analysis of adherent cells or tissue slices, for nanobiotechnology projects as lab on chip, biochips
The OmniGrid Micro can dip into a source plate and spot the sample solution onto a solid surface (e.g. glass slide, silicon substrate). In touching the surface with the pin, a given volume of sample is deposited onto the surface. Using the optional split microspotting pins, up to 200 consistent spots can be produced from a single dip.
A vacuum wash station ensures active washing in between sample transfers while humidity control minimizes evaporation of precious sample. The equipment has a print speed of 10,000 spots/11 slides in less than 3.5 hr (with optional split pin).
“GeneTAC UC4 Microarray Scanner” –this equipment is used for reading the chips, acting as a pair of the nano-plotter, for DNA detecting and deposition. This two-color system includes green (532nm) and red (635nm) lasers coupled with high performance optics optimized to maximize collection of fluorescence signal while minimizing the damage caused by photobleaching. The scanner includes hardware and powerful and easy-to-use microarray analysis software for fast and reliable imaging, collection and storage of very large data sets and consolidates these data with experimental information
Plasma RIE - Dry etching equipment, for silicon, Si3N4, polisilicon, using a gas mixture (freon, oxygen, nitrogen). The major advantages: anisotropy (allowing realization of nanostructures), dry etching (no chemicals), reproducibility, uniformity, aspect ration up to 30:1, high selectivity to resist and SiO2, special processes realization (like: silicon deep etching for membranes configuration, metal etching).
Low Pressure Chemical Vapour Deposition Equipment (LPCVD) for thin layers deposition allowing polysilicon, silicon nitrides, and silicon carbide deposition in MEMS and NEMS manufacturing process. Advantages: very thin layer deposition (in the nm range), reproducibility, uniformity, control, usage in micro and nanotechnologies.
Pattern Generator - Allows the direct transfer of the layout geometries from design to electrosensitive layer on the masks, using an electron beam. Its resolution is in the nm scale.
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