MINAFAB Characterization equipments

Refractometer for layer thickness measurements - NanoCalc-XR

Contact persons: Andrei Avram, PhD stud; Catalin Marculescu PhD


  • Studies of various materials thickness on small scales.
  • Accurate measurements of grown or deposited thin films.
  • The provided information is useful for optimising silicon oxide growth or deposition of oxides and nitrides in LPCVD and PECVD equipments.
  • Provides useful information regarding spin coated polymers and photoresists.
  • Measurement of refractive index

General characteristics:

  • Transmission and reflection measurements of anti-reflective & hardness coatings
  • Wide wavelength measurements (250nm to 1050 nm)
  • Can measure up to 10 layer stacks
  • Angle of incidence: 90o


  • Resolution: 0.1 nm
  • Thickness range: 10nm to 100μm
  • Defect and roughness tolerant measurements
  • Database for a broad range of materials
  • Fast measurement process: 100ms to 1s


  • Easy to use
  • Wide measurements range
  • Can measure thicknesses for a wide range of materials
  • Small footprint: light and portable
  • Assisted by powerful computational software



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Last update: February 27, 2011