NEVA EDV-500A Electronic Beam Gun, EVD-500A Basic System
E-beam high vacuum thin film deposition system
Description
- Materials : Au, Al, Ag, Cr, Ni, Pt
- 4 Crucibles Electronic Beam Gun
- Deposition Thickness Controller (Digital display with rate control)
- Film thickness: 100nm to 1000nm
- maximum load per run: 30 wafers/3" or 18 wafers/4" or 12 wafers/5"
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Applications:
- electronics, electrooptics, photonics, biosensors
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Last update: February 27, 2011 |
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