MINAFAB Characterization equipments

Scanning Electron Microscope (SEM-Vega II LMU) and Pattern Generator (PG Elphy Plus)
TESCAN s.r.o  and  RAITH GmbH


SEM - General purpose scanning electron microscope, tungsten heated filament. Maximum resolution 5nm@30kV, SE and BSE detectors, low vacuum working mode up to 250Pa, movements: X= 80 mm - motorized Y= 60 mm - motorized Z= 47 mm - motorized PG- 6 MHz high-speed pattern generation hardware, 16 bit DAC vector scan beam deflection, 2 ns writing speed resolution, TTL and 100 V blanking signal drivers.



  • general purpose SEM imaging using secondary electrons (topography) and backscattered electrons (composition).
  • electron beam lithography with sub-50nm resolution


Application scientist: phys. Adrian Dinescu [email protected]
eng. Marian Popescu, [email protected]



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Last update: March 5, 2012